Abstract
Abstract In this work, we have optimized the device structure to achieve a maximum drain current of Nanoelectronic AlGaN/GaN single-heterojunction high electron mobility transistors (HEMTs) by the variations of mole fraction, doping concentration and gate length, using the SILVACO-ATLAS software tool. The drain current increases at higher aluminium mole fraction of AlGaN nano-layer. The drain current increases at higher doping concentration of AlGaN nano-layer. The drain current reduces at higher gate length of HEMTs. The conduction band engineering in terms of quantum wells is investigated in detail by involving the Bose-Einstein expression. The simulation results of this work are supported by the available previous experimental results and analytical modelling. This work will be useful to fabricate the AlGaN/GaN HEMTs experimentally for bioengineering applications.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
