Effect of Microstructure of TiN /TiCN Layer on the Structural, Mechanical and Tribological Properties of the Ti/TiN/TiCN Films

Abstract

A direct current magnetron sputtering (DCMS) system at room temperature was applied to deposit the Ti/TiN/TiCN films. In order to research the effect of the microstructure of the TiN/TiCN layer on the Ti/TiN/TiCN films, the deposition time ratio of the TiN/TiCN layer ranged from 28.57 to 200%, and the whole deposition time of the films and the deposition time of Ti layer were constant. In this work, the relationship between structure and mechanical properties of films were investigated. The research results showed that the composition and structure of the films only slightly changed, while the crystalline orientation of the TiCN layer was of significant variation with the deposition time of the TiN layer. It is shown that the adhesion strength and internal stresses were 18.6 ± 1.5 N and 140 MPa when the deposition time ratio was 50%. By adjusting the deposition time ratio, the films displayed significant improvement in tribological behaviors. The coefficients of friction (COF) for the films deposited under deposition time ratio of 50% were about only 0.139 when the value of COF was stabilized. This work can provide a good wear-resisting film prepared approach at room temperature.