Abstract
A two-dimensional (2D) model coupling computational fluid dynamics (CFD) with chemical kinetics is built to investigate the hydrodynamics and film growth characteristics for Al2O3 deposited from trimethylaluminum (TMA) and water in a spatial ALD system with flat and microgroove substrates. Results show that a vortex flow appears at both sides of the microstructure corners. The vortices hinder the gas flow in the micro-gap, leading to weaker convective mass transfer of precursors to the microstructure corners. Compared to the front corner of the step towards the precursor injector, less precursor concentration is detected at the back corner of the step. The deposition rate at the back corner is always the lowest due to the lowest precursor concentration. A relative lower speed of the substrate can ensure the saturated adsorption of precursors on the substrates, thus improving the conformality of the film deposited on the microstructures.
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