Effect of micro-crack and reaction product on laser damage performance of optical glass during chemical etching

Abstract

Chemical etching is usually utilized to improve the laser damage performance of optical glass by mitigating microcracks, while it inevitably produces some reaction products (RPs). In this paper, two K9 glasses with good quality and two K9 glasses with micro-cracks are etched, statically or dynamically (high-frequency ultrasonic agitation). The morphologies of cracks and RPs are characterized, and the laser-induced damage thresholds (LIDTs) are measured. The results show that with the increase of etching time, the LIDT increases slightly at first and then decreases gradually for the glass with RPs, and the LIDT increases at first and then stabilizes for the glass without RPs. Using finite-difference time-domain method, the light intensities around crack, RP and their combination are simulated, respectively. The results indicate that the light intensity enhancement factor (LIEF) increases at first and then decreases with the decrease of crack aspect ratio, and the LIEF increases with RP radius. The LIEF for the combination is generally larger than that for one crack or one RP, which greatly depends on the relative distance between the crack and the RP. Experimental and simulated results complement each other, revealing the influence mechanism of crack and RP on the LIDT. This work would contribute to improving the LIDT of optical glass by chemical etching.