Abstract
The effect of ion bombardment on the growth of Nb films and their crystal structure is investigated. Epitaxial niobium films with the (001) orientation are grown on (01i2) Al2O3 substrates heated to 600°C and biased at −20 V. Niobium films with pronounced axial texture in the [110] direction are grown on water-cooled Sitall (devitrified glass such as Pyroceram) substrates. In Nb films biased at −50 V, which are in the superconducting state, the motion of individual magnetic vortices is observed with a magnetooptic indicator.
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