Abstract
The effect of low-energy deposition particles on the initial stage of thin film growth is studied by Monte Carlo simulation in this paper. The energy range of deposition particles is from 0 to 0.7eV. Three processes are considered: atom deposition, adatom diffusion and re evaporation. The effect of nearest adatoms and next near adatoms is also considered. The results show that the low-energy ion irradiation strongly affects the island film growth process at low temperature. Morphologies and size distributions of islands have significantly changed with the increase of incident ion energy.
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