Abstract
Films composed of a mixture of Na-β- and βʹʹ aluminas (β/βʹʹ-alumina) were prepared via laser chemical vapor deposition (CVD) upon the addition of Li. The effect of the Li source gas on the phase formation, microstructure and deposition rates of the β/βʹʹ-alumina films was investigated. The Na-β/βʹʹ-alumina films were formed at a Li/Al precursor supply ratio (RLi/Al) of 0.1–1.0 within a deposition temperature (Tdep) range of 1100–1220K. The Na-β/βʹʹ-alumina phase was exclusively formed at Tdep=1165–1185K and RLi/Al=0.1–0.5, whereas α-Al2O3 (with minor amounts of LiAlO2 and LiAl5O8) was predominantly observed at Tdep>1223K and RLi/Al >1.0. The Na-β/βʹʹ-alumina films were composed of polygonal facets in sizes of several hundred nanometers with a columnar cross section. The deposition rate of the Na-β/βʹʹ-alumina film was 60µmh−1.
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