Abstract
Anisotropic Nd-Fe-B film magnets are applied to miniaturized electronic devices and MEMS (Micro Electro Mechanical Systems) devices have been prepared by the sputtering method. However, the thickness of each film is mainly less than 20 μm. We have already fabricated anisotropic rare-earth film magnets by pulsed laser deposition (PLD) technique. In this study, an investigation has been carried out on increasing laser beam power for a high deposition rate. Although the thickness of the films increases as laser power increases, it is suggested that the residual magnetic polarization ratio and coercivity values of anisotropic Nd-Fe-B film magnets are not allowed to deteriorate with increasing laser power or deposition rate. These results suggest that we have the facility in obtaining perpendicularly anisotropic Nd-Fe-B thick-film magnets using the PLD method.
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