Abstract
The laser-induced damage threshold (LIDT) of optical thin film is influenced by certain preconditioning processes. HfO<sub>2</sub>/SiO<sub>2</sub> 532nm high reflective multi-layers were prepared by electron beam evaporation and were preconditioned by 532nm laser. The 532nm LIDT, surface condition, and damage morphology of the sample were characterized and compared before and after laser conditioning process. Results are presented that the LIDT of e-beam deposited multilayer HfO<sub>2</sub>/SiO<sub>2</sub> thin films can be increased after laser conditioning. Possible reasons for such enhancement have been analyzed.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Published version (
Free)
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
