Abstract
Amorphous carbon-based thin films, a-C:H:Si:O:F, were obtained by plasma immersion ion implantation and deposition (PIIID) from mixtures of hexamethyldisiloxane, sulfur hexafluoride and argon. For PIIID the sample holder was biased with negative 25 kV pulses at 60 Hz. The main system parameter was the proportion of SF6 in the reactor feed, Rsf. To allow comparison to growth without intentional ion implantation, some films were also grown by plasma enhanced chemical vapor deposition (PECVD). The objectives were to investigate the effects of fluorine incorporation and ion implantation on the film's chemical structure, and principally on the surface contact angle, hardness and friction coefficient. Infrared and X-ray photo-electron spectroscopic analyses revealed that the films are essentially amorphous and polymer-like, and that fluorine is incorporated for any non-zero value of Rsf. Choice of RSF influences film composition and structure but ion implantation also plays a role. Depending on Rsf, hydrophilic or hydrophobic films may be produced. Ion implantation is beneficial while fluorine incorporation is detrimental to hardness. For ion implanted films the friction coefficient falls about one third as Rsf is increased from 0 to 60%. Films prepared by PIIID without fluorine incorporation present fairly low friction coefficients and hardnesses greater than those of conventional polymers.
Highlights
IntroductionThe electronics industry fabricates miniaturized components from materials that match thin structures with specific electrical properties [1,2,3]
There is at present a growing need for the development of nanoscale devices
The results presented here show that the chemical composition and structure of the films deposited from plasmas of mixtures of hexamethyldisloxane, sulfur hexafluoride and argon depend on the proportion of gases used and the degree of ionic bombardment induced during film growth
Summary
The electronics industry fabricates miniaturized components from materials that match thin structures with specific electrical properties [1,2,3]. The production of microscopic three-dimensional structures, such as pistons, capacitors, transformers and gears, is another promising area with selected material requirements [47]. The production of thin films of a specific material is, a first requisite for such technologies. Such films or layers are used for these ends. The greatest spectrum of studies in this area deals with surface modification of materials by coating [8,9,10,11] the surface properties of the material are modified while the bulk properties remain essentially unchanged
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