Abstract
Ion-beam surface bombardment modification technology is successfully used to manufacture different kinds of nano-textures on the surface of silicon substrate. Relationship between the morphology and arrangement patterns of nano-textures and the bombarding parameters is studied. Results show that the ion-beam bombardment has a significant impact on surface morphology. Different kinds of textures on silicon substrate can be formed according to the variation of bombardment time. The nanodot array texture is observed on the surface of silicon substrate when the duration of argon ion-beam bombardment is 15 minutes. Simultaneously, the tetrahedral amorphous carbon film is deposited on the silicon substrates that have different kinds of nano-texture. The microstructure of ta-C film deposited on unprocessed and nano-textured silicon substrate is analyzed by X-ray photoelectron spectroscopy. Results indicate that the content of sp3 bonds decreases with increasing bombardment time, and thereafter keeps a steady value. The ta-C films deposited on the nanodot-textured substrate shows the lowest sp3 fraction. It is also observed by friction and wear test that the wear time is enhanced from 10 to 70 min. The tribological properties is highly improved when the coating is deposited on the nano-textured substrate.
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