Abstract
Interface states have been shown to have an appreciable effect on the performance of p-GaAs multilayer (p+-i-p+-i-…) homojunction interfacial work function internal photoemission (HIWIP) far-infrared detectors. In this article, a comparison of detector performance was made of p-GaAs HIWIP detectors with different interface state densities, with the emphasis on the detector’s dark current, noise, and capacitance characteristics.
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