Abstract
The oxidation resistance and tribological behavior of CrAlN/SiN x multilayer films with different interface structures were investigated. The multilayer film exhibited better oxidation resistance than the monolithic CrAlN film after oxidation at 900 °C and 1000 °C for 10 h. The crystalline SiN x sublayer was beneficial to oxidation resistance at 900 °C in contrast to the trend observed after oxidation at 1000 °C. The stacking faults generated in the multilayer film were induced by the oxidation of SiN x . The diffusion mechanism changed from the outward diffusion of cations to an inward diffusion of anions when the temperature was increased to 1000 °C. The multilayer film with a crystalline interface exhibited lower coefficient of friction (COF) and better tribological properties than the CrAlN film and multilayer with an amorphous interface.
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