Abstract

The effect of surface roughness and surface chemistry of SiLK and Parylene polymers on the water droplet contact angle was investigated using Atomic Force Microscopy (AFM) and X-ray Photoelectron Spectroscopy (XPS). AFM images show that the surface morphologies of SiLK and Parylene treated with H 2SO 4 and H 3PO 4 solutions are qualitatively the same as those of the untreated SiLK and Parylene. However, the advancing ( θ a) and receding ( θ r) contact angles on SiLK dramatically decrease from θ a = 70 ± 3° and θ r = 63 ± 2° to θ a = 37 ± 2° and θ r = 34 ± 3°, respectively, after being treated with a H 2SO 4 solution. In contrast, the advancing and receding contact angles on SiLK treated with H 3PO 4 solution or Parylene treated with H 2SO 4 or H 3PO 4 solutions were changed within a few degrees. XPS results show that polar functional groups (C O and –OH) formed on the SiLK sample surface after being treated with H 2SO 4 solution. However, H 3PO 4 reacts less aggressively with the ethynyl (–C C–) bonding on the SiLK surface compared with H 2SO 4. Parylene lacks ethynyl chemistry and is therefore chemically more inert than SiLK. Thus, both H 2SO 4 and H 3PO 4 solutions have fewer reactions with Parylene resulting in slight changes in the advancing and receding contact angles.

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