Abstract
Effect of hydrogen plasma treatment on the growth and microstructures of multiwalled carbon nanotubes
Highlights
Since its discovery carbon nanotube [1] has attracted great attention because of its unique structure and properties
We investigated the effect of different dilution gases such as H2, NH3 and N2 and their different composition on the growth and microstructure of carbon nanotubes (CNTs) by microwave plasma enhanced chemical vapor deposition (CVD) (MPECVD) process on Fe coated Si substrates using C2H2 as feed gas [17]
The catalyst coated substrate was loaded into the reactor chamber of the MPECVD system and the chamber was evacuated to a base pressure of 5.0 ×10-3 Torr by a mechanical rotary pump
Summary
Since its discovery carbon nanotube [1] has attracted great attention because of its unique structure and properties. We investigated the effect of different dilution gases such as H2, NH3 and N2 and their different composition on the growth and microstructure of CNTs by microwave plasma enhanced CVD (MPECVD) process on Fe coated Si substrates using C2H2 as feed gas [17]. To the best of our knowledge, effect of H2 plasma pretreatment of iron oxide films on the growth and structure of CNTs by MPECVD process have not been reported.
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