Effect of growth conditions on formation of grain boundaries in epitaxial silicon layers

Abstract

The formation of grain boundaries of the general type, along with small-and large-angle symmetric grain boundaries with the 〈 〉 axis in the epitaxial layers grown onto bicrystal substrates by the method of thermal migration has been studied. The solvent was aluminum. It is shown that if the grain boundaries in the epitaxial layer are tilted to the crystallization front or if there is a temperature gradient tangential to this front, their orientation differs from their orientation in the substrate. The large-angle symmetric boundaries are more stable than the boundaries of the general type. The grain-boundary energy and rotation moment of large-angle symmetric boundaries are evaluated.