Abstract
Lead-free K0.5Na0.5NbO3 thin films with different excess ratios of alkali metal were prepared by chemical solution deposition method. The volatilization rate of the K, Na elements at a certain temperature was calculated by EDS analysis. The volatilization rate of K element is 55% and Na element is 10% when the KNN thin film was pre-sintered at the temperature of 375 °C and then final heated at the temperature of 675 °C. The prepared KNN thin films with the right excess ratios (K-55%, Na-10%) obtained uniform and dense microstructure, and gain well ferroelectric property.
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