Abstract

The presence of both gold and polycrystalline silicon in a given microelectromechanical systems (MEMS) device can profoundly impact surface properties through an electrochemical reaction occurring during micro-fabrication processing. Tests show a mechanistically similar increase in surface roughness with an increased ratio of gold (cathode) to silicon (anode) surface area, and with prolonged galvanic reaction time. This is attributed to increased ion transfer due to either increased electrochemical current or increased reaction time. Furthermore, microdevices with greater process-induced surface damage were found to have lower contact adhesion. The increased surface roughness decreases the intermolecular forces that contribute to adhesion due to increased average asperity separations. Results are interpreted in light of the principle galvanic corrosion mechanism and the effect on the primary nanoscale intermolecular forces. [2016-0172]

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.