Abstract
A mathematical model of dc gas discharge plasma has been developed in order to determine the electric field strength at a substrate surface during plasmachemical deposition of carbon nanostructures. A numerical solution of the model equations has been obtained using the experimentally determined boundary conditions and model parameters. A comparison of the solution to experiment confirms the adequacy of the proposed mathematical model, which provides the electric field profiles and the electron and ion density distributions near the substrate surface. Estimations show that, for carbon nanostructures with a characteristic size of about 30 nm, the electric field strength at the surface is sufficiently high to provide for their directional growth along the field.
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