Abstract
This paper analyses the three-dimensional (3-D) surface texture of Copper oxide nanowires grown on different substrates and in an electric field. Atomic force microscopy, X-ray diffraction and field emission scanning electron microscopy analyses were applied also to characterize the 3-D surface texture data in connection with the statistical, and fractal analyses. This type of 3-D morphology allows a deeper understanding of structure/property relationships and studies the effect of micromorphology on CuO nanowires grown in electric field and the impact of growth direction on their properties. It also provides a compact representation of complex micromorphology information.
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More From: Journal of Materials Science: Materials in Electronics
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