Abstract
To further improve the laser-induced damage threshold of fused silica elements after Hydrogen Fluoride (HF) acid dynamic acid etching, the effect of the nanoparticle SiO2 jet polishing on the surface quality and laser damage properties of fused silica was studied. On the fused silica surface after HF acid dynamic etching, different depths were polished with nanoparticle SiO2 jet, and their surface roughness were measured by In-situ detection. The photothermal absorption, laser damage threshold and surface contamination element concentration at different depths were measured. The experimental results show that the RMS value of the surface roughness of the surface is reduced from 1.440nm to 0.507nm, and surface contamination elements are removed. The laser damage threshold is improved by 10%. The results show that nanoparticle SiO2 jet polishing can remove surface damage and contamination after HF acid dynamic etching on the basis of elastic processing. Therefore, laser damage threshold can be improved.
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