Abstract
Tantalum oxide films were prepared using pulsed laser deposition without any exchange of the Ta target. As the number of laser shots increased, the density of metal-rich droplets on the film increased and the droplet diameter became larger, leading to an increase in the total surface area of droplets. The corrosion resistance of the films was characterized by potentiostatic testing in a 3.5 mass% NaCl solution at 400 mV. It was found that the corrosion resistance improved as the O/Ta composition ratio approached its stoichiometric value. Corrosion was observed to originate at local surface pits produced by Cl -1 ions. These pits were formed at the boundaries between the film and droplets whose diameters were larger than the film thickness.
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