Abstract
The influence of the active layer dopant on the degradation of GaAs–Alx Ga1−xAs double-heterostructure lasers has been studied using pulsed excitation. Compensated p -type dopants give the slowest degradation, while n -type dopants give the most rapid. These results can be understood on the basis of arsenic vacancy migration and the formation of arsenic vacancy-acceptor complexes.
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