Abstract

Effects of disk edge profile on scattering characteristics of liquid droplets splashed from a rotating disk edge are experimentally investigated. In the present research, aluminum disks are utilized and purified water is employed for liquid. Scattering phenomena of the droplets are captured by the high-speed digital camera. Distribution of the droplet diameter is evaluated from these images and distributions of horizontal flying velocity component and angle of the droplets are measured by human visual observation of images. Liquid filaments are stretched outward from the stagnant liquid layer on lateral surface of disk edge by centrifugal force. Two main peaks appear in the distribution of the scattered droplet diameter and they are originated from large terminal droplets and small droplets generated from filamentwise breakup. Most of the scattered droplets fly slightly inside of the tangential direction of the disk edge. The water droplets splashed from the disk scatters with regularity compared with ethanol droplets.

Highlights

  • Development of high technology has been required for formation of thin uniform film in manufacturing process of semiconductor

  • Two main peaks appear in the distribution of the scattered droplet diameter and they are originated from large terminal droplets and small droplets generated from filamentwise breakup

  • The peak around d = 280 μm is originated from the small droplets generated from the filamentwise breakup

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Summary

Introduction

Development of high technology has been required for formation of thin uniform film in manufacturing process of semiconductor. If the mist of the scattered photoresist reattaches on the liquid film surface in the process, it interferes in the uniform film formation. If the mist of the scattered liquid reattaches on the wafer in the process, it makes water mark on the wafer surface and the particle bridges and damages the electric circuits on the wafer. The scattering characteristics of the liquid droplets and the reattachment phenomena of the mist on the wafer and effect of disk edge profile have not been clarified yet [8]. Main objective of the present research is to make clear the effect of disk edge profile on the scattering characteristics of the liquid droplets splashed from the rotating disk edge experimentally.

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