Abstract
SiC films were chemically vapor deposited onto graphite substrates using methyltrichlorosilane (MTS, CH3SiCl3) as a source and argon or hydrogen as diluent gases to investigate the effect of each diluent gas on growth behavior and characteristics. Each diluent gas used had a relative difference in deposition rate within a certain temperature region. Such growth characteristics of the SiC films as preferred orientation, microstructure, and chemical composition varied remarkably with the diluent gas used. Microhardness and surface roughness were compared for SiC films prepared using the different diluent gases.
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