Abstract

In this work, rear-contact passivated Cu(In,Ga)Se2 (CIGS) solar cells were fabricated without any intentional contact openings between the CIGS and Mo layers. The investigated samples were either Na free or one of two Na supply methods was used, i) a NaF precursor on top of the Al2O3 rear passivation layer or ii) an in situ post-deposition treatment with NaF after co-evaporation of the CIGS layer. The thickness of the ALD-Al2O3 passivation layer was also varied in order to find an optimal combination of Na supply and passivation layer thickness. Our results from electrical characterization show remarkably different solar cell behavior for different Na supplies. For up to 1 nm thick Al2O3 layers an electronically good contact could be confirmed independently of Na deposition method and content. When the Al2O3 thickness exceeded 1 nm, the current was blocked on all samples except on the samples with the NaF precursor. On these samples the current was not blocked up to an Al2O3 layer thickness of about 6 nm, the maximum thickness we could achieve without the CIGS peeling off the Al2O3 layer. Transmission electron microscopy reveals a porous passivation layer for the samples with a NaF precursor. An analysis of the dependence of the open circuit voltage on temperature (JVT) indicates that a thicker NaF precursor layer lowers the height of the hole barrier at the rear contact for the passivated cells. This energy barrier is also lower for the passivated sample, compared to an unpassivated sample, when both samples have been post-deposition treated.

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