Abstract
High density、uniform particles diamond films were synthesized by microwave plasma chemical vapor deposition (MWPCVD) method on Si (100). In order to improve field emission properties of thin films, sputtering the metal Ti、Al、Mo、Ni on the diamond surface respectively，and compared the kinds of diamond/metal composite film of field emission performance. The results show that the field emission properties of diamond / metal Ti composite thin film are better. The possible mechanism will be discussed in this study.
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