Abstract

The phase behavior of zein films has been investigated at nano-scale using atomic force microscopy (AFM) and compared to the phase behavior of the bulk using a thermal characterization technique. The local surface properties of the films were evaluated as a function of water activity using AFM. The glass transition temperature (Tg) of zein films decreased with increasing water activity. Adhesion forces measured by the AFM force curves increased with increasing water activity. Topography of zein and zein fractions were evaluated both qualitatively and quantitatively by the use of AFM and dedicated software to calculate the surface roughness. It has been found that processing technologies (solvent casting, drop deposition and spin casting) has influence on the surface structures of films. The films which were formed by the alpha zein rich fraction were found to have highest roughness values. Sectional surface profiles revealed that α-zein films have mean roughness (Ra) of 1.808 nm and root mean square roughness (RMS) of 2.239 nm while β-zein films have mean roughness (Ra) of 1.745 nm and root mean square roughness (RMS) of 3.623 nm. The discussions conducted on the differences/similarities in the observations were based on the hydrophobic/hydrophilic properties and interactions of these zein fractions.

Full Text
Published version (Free)

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call