Abstract
A thorough evaluation was conducted of the structural and nano-mechanical characteristics of oxynitride coatings with TaOxNy structures formed by reactive magnetron sputtering at different flows of the reactive oxygen/nitrogen gasses. Tantalum oxynitrides exhibit a broad range of modifications in their structure and elemental content depending on the conditions of deposition. The TaON structures combine the characteristics exhibited by tantalum nitride, used as a hard material for tribological and mechanical applications, with the excellent dielectric properties of the tantalum oxide. The results discussed point to the deposited tantalum oxynitrides being promising candidates for biomedical applications.
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