Abstract
In this paper, in order to explore the effect of the preferential orientation of Cu on the preparation of robust anodized Cu2O films, three types of Cu substrates with three different preferential crystal plane orientation [(111), (200), (220)] are employed. FirstâPrinciples calculation is employed to calculate the surface energy of different Cu crystalline planes by the software of DACAPO, which is conducted by the planeâwave pseudoâpotential method. The influence of the preferential plane orientation of Cu on the anodized oxidation reaction process and the morphology of anodized CuxO films has been discussed in detail. The results indicate that the morphology of anodized CuxO films depends on the preferential exposing plane orientation of Cu substrates under the same anodized oxidation condition. The high surface energy of Cu makes Cu atoms release more easily from lattices, leading to more different activeâreaction sites.
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