Abstract
A pulsed-dc (direct current) magnetron sputtering with a plasma emission monitor (PEM) system was applied to synthesize Cr-containing hydrogenated amorphous diamond-like carbon (Cr-DLC) films using a large-size industrial Cr target. The plasma emission intensity of a Cr atom at 358 nm wavelength was characterized by optical emission spectrometer (OES). C2H2 gas flow rate was precisely adjusted to obtain a stable plasma emission intensity. The relationships between Cr atom plasma emission intensity and the element concentration, cross-sectional morphology, deposition rate, microstructure, mechanical properties, and tribological properties of Cr-DLC films were investigated. Scanning electron microscope and Raman spectra were employed to analyze the chemical composition and microstructure, respectively. The mechanical and tribological behaviors were characterized and analyzed by using the nano-indentation, scratch test instrument, and ball-on-disk reciprocating friction/wear tester. The results indicate that the PEM system was successfully used in magnetron sputtering for a more stable Cr-DLC deposition process.
Highlights
Metal-containing hydrogenated amorphous diamond-like carbon films (Me-DLC) have raised much attention for decades because of their promising performance, such as high nano-hardness, chemical inertness, excellent tribological properties, and thermal stability [1,2,3,4]
Me-DLC films are synthesized by hybrid magnetron sputtering using a metal target with a hydrocarbon gas [8,9]
Our results demonstrate that the plasma emission monitoring (PEM) system is an effective method for stabilizing the deposition process of the containing hydrogenated amorphous diamond-like carbon (Cr-DLC) films at different Cr atom plasma emission intensities, and the Cr-DLC film deposition rate is as high as 92.7 nm/min
Summary
Metal-containing hydrogenated amorphous diamond-like carbon films (Me-DLC) have raised much attention for decades because of their promising performance, such as high nano-hardness, chemical inertness, excellent tribological properties, and thermal stability [1,2,3,4]. An inherent feature in this conventional hybrid deposition process, combining magnetron and plasma assisted chemical vapor deposition, is high instability due to the complex relation between the fluxes of reactive gas and sputtered metal from the target. It inevitably suffers from the “hysteresis effect”, immediate rapid transition from metal to poisoned state [10,11] Such behavior originates from the formation of carbide on the target surface, leading to a significant decrease in the sputtering yield or a non-reproducible quality of films. Our results demonstrate that the PEM system is an effective method for stabilizing the deposition process of the Cr-DLC films at different Cr atom plasma emission intensities, and the Cr-DLC film deposition rate is as high as 92.7 nm/min
Sign-in/Register to view highlights & summary Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
