Effect of Composition of Substrate-Modifying Random Copolymers on the Orientation of Symmetric and Asymmetric Diblock Copolymer Domains

Abstract

The ability of random copolymer brushes and cross-linked mats to induce the vertical orientation of domains in overlying films of lamellae- and cylinder-forming block copolymers was investigated as a function of the composition. The substrate-modifying layers consisted of styrene and methyl methacrylate random copolymers and contained either a terminal hydroxyl group or a third polar comonomer of 2-hydroxyethyl methacrylate (HEMA) for grafting brushes to silicon oxide surfaces or glycidyl methacrylate (GMA) for cross-linking the random copolymer into a mat. Polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) lamellae- and cylinder-forming block copolymers (both PS and PMMA minority block copolymers) were deposited and annealed on the modified surfaces. In all cases the vertical orientation of domains was observed for a range of random copolymer composition, but the ranges of composition were different for each combination of surface layer and block copolymer. The cylindrical domains of PS exhibited vertical structures for a very narrow range of compositions compared to cylindrical domains of PMMA or lamellae. As expected, the incorporation of polar HEMA or GMA monomers in the surface layers shifted the composition range for the perpendicular orientation of domains to higher fractions of styrene. The results are discussed in terms of the equilibration of the films in the presence of the chemically modified surfaces.