Abstract
The character of a low-frequency nitrogen plasma in a medium vacuum reactor was studied by determining the effect of chamber pressure on the electrical impedance of the plasma. The system understudied was a mini capacitive plasma reactor utilizing 40 kHz generator. The pressure was varied from 0.4 – 4.7 torrs. Results of this work indicated that the pressure in the range significantly affects the electrical impedance. The increase of the chamber pressure decreased the capacitive reactance while increased the resistance. The capacitive plasma indicates the plasma was controlled by excitation and ionization process, while the resistive plasma exhibits complex reactions due to collisions.
Highlights
Plasma technology has been long developed for many purposes
A previous study using optical emission spectroscopy (OES), shows that nitrogen plasma consists of neutral nitrogen molecule N2, excited atom N* and molecules N2*, and ions such as N+ and N2+ (Santjojo and Aizawa, 2014; Santjojo and Aizawa, 2015)
There was a significant effect of chamber pressure on electrical impedance
Summary
Plasma technology has been long developed for many purposes. One of the application is utilizing a nitrogen plasma to modify surfaces such as surfaces of tools to improve their hardness or surfaces of sensors to improve their functions. The dynamic of plasma creates variation in ions temperature, the whole plasma is neutral and in thermal equilibrium state. A certain plasma environment such as pressure, temperature and power can affect the thermal equilibrium of the plasma. A number of different methods and technique have been applied to determination the plasma impedance, such as: (a) power dissipation and impedance measurement in RF discharges (Spiliopoulos et al, 1996), (b) measuring current, voltage and impedance in RF plasma, and (c) asymmetric electrical characteristics (Sobolewski, 1995). The model was used to predict the character of the plasma from different pressure regimes of the plasma system At this stage, the characteristic information obtained from the measurement and the model have not been utilized to predict the plasma parameters i.e. ion temperature, ion density and electron density. This work is important as a part of a dedicated control system design for the low 40 kHz frequency plasma system
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