Abstract
AbstractNickel films were deposited on silicon substrates using magnetron sputtering method. The pretreatment process of nickel films under high temperature and ammonia atmosphere was investigated. The thickness of nickel film has a great influence on growth morphology of carbon nanotubes (CNTs). Too large or too small thickness would do harm to the orientated growth of CNTs. The inner structure, elements composition and growth mechanism have been confirmed by TEM and EDX characterization. The surface wettability and drag reduction property of CNTs were investigated. This paper can provide a new, effective method to further develop the practical application in micro/nano devices field.
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