Abstract
The nanocrystalline Ti 5Si 3 and Ti 5Si 3C 0.8 films with an average grain size of 15 nm were prepared on Ti–6Al–4V alloy substrate by double glow discharge plasma technique. The electrochemical behaviour of two nanocrystalline films has been characterised by potentiodynamic polarization and electrochemical impedance spectroscopy (EIS) in 3.5 wt.% NaCl solution. The electronic properties of the passive films were investigated by Mott–Schottky analysis. The results revealed that the calculated donor densities are lower and the space charge region thicker for nanocrystalline Ti 5Si 3C 0.8 film as compared to nanocrystalline Ti 5Si 3 film, suggesting that the passive layer formed is more protective.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
