Effect of Bombardment of High Energy Ions onto Growing Surface on Structure and Properties of Sputtered Magnetic Films

Abstract

Magnetic thin films (Co-Ta, Co-Zr and pure iron films) have been deposited by means of dual ion beam sputtering and the effect of bombardment of high energy ions onto growing surface on their structure and properties has been investigated. The bombardment of argon ions with proper kinetic energy has the effects as follows;I. suppression of growth of crystallites, II. improvement of structural ordering in micro-scale and III. improvement of structural uniformity in macro-scale. Therefore, the films deposited with the proper bombardment are composed of fine crystallites with good atomic ordering. This causes an increase of 4лMs and reduction of Hc of the films;Co-Zr:4лMs=16 kG, Hc<0.6 Oe, Co-Ta:4лMs=15 kG,Hc<0.3 Oe and iron films:4лMs=21 kG,Hc=l Oe.