Effect of B/N dual doping on mechanical and tribological properties of Mo-S-B-N sputtered films

Abstract

Doping with non-metal element is effective to improve the porous morphology and enhance the mechanical and tribological properties of transition metal dichalcogenides (TMDs) based film. However, the mechanical properties of TMDs based film with single additive should be enhanced further for better wear resistance. In this work, B/N dual-doping was used to further enhance the deformation resistance and toughness of MoS2 based films deposited by magnetron sputtering, while the effect of B/N dopants on the structure, mechanical and tribological properties has been investigated. Mo-S-B-N film with B content of 20.91 at. % and N content of 18.13 at. % consists of MoS2 and amorphous nitride/boride, in which B/N dual doping film forms a higher ordered MoS2 lamellar structure compared to B doping film. With a hardness of 11.6 ± 0.9 GPa and improved toughness, the film achieves a low wear rate and average friction coefficient is achieved. Comparing B/N dual doping film to B doping film, the stable formation of tribolayer with more strengthened deformation resistance results in the steady friction and the improved wear resistance, while the limited TMDs reorientation leads to the slight increase of friction coefficient.