Effect of bias voltage on the texture of the TiN and ZrN coatings deposited by vacuum ion-plasma method

Abstract

An X-ray diffraction method was used to study the formation of the crystallographic texture of vacuum ion-plasma TiN and ZrN coatings depend on the bias voltage on the substrate. It is shown that, at high values of the bias voltage (-100 V), a pronounced texture forms in TiN coatings and a two-component (111) + (113) texture in ZrN coatings. A decrease of the bias voltage to –10 V leads to a twofold increase in the hardness of the coatings, a non-texture state of TiN, and a weakening of the texture of ZrN coatings.