Abstract
The effect of basic additives on a negative electron-beam resist utilizing acid-catalyzed intramolecular dehydration of 1,3,5-tris(2-(2-hydroxypropyl))benzene (Triol) was investigated. Quinoline was selected as the most effective additive to suppress acid-diffusion among investigated ones. Though the addition of quinoline decreased the Triol resist sensitivity, it enhanced the contrast and critical-dimension (CD) deviation stability to post-exposure-baking temperature variation. Optimized resist system achieved the CD deviation stability: 1.5 nm/°C and 100-nm line and space patterns with a dose of 6.2 µC/cm2 @ 50 kV. Influence of the additive on the Triol resist insolubilization mechanism was discussed.
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