Abstract

Results of investigations of the optical properties of amorphous and microcrystalline Si:H, Cl films obtained from an SiCl 4-H 2-Ar glow discharge are reported. It was found that both the crystallinity and the impurity content (hydrogen and chlorine), which are important in determining the optical properties, are strongly influenced by the addition of argon. In particular, a marked effect of the crystalline grain size on the degree of disorder is found.

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