Abstract
The TiAlN and TiAlLaN coatings were deposited on cemented carbides (YG8) and (111) silicon wafers by using a hybrid PVD coater. The composition, microstructure, mechanical properties and oxidation resistance of the coatings deposited at different nitrogen flow rates were evaluated. The concentration of titanium decreased when the N2 gas flow was increased during the deposition, and Al/Ti ratios of the coating were lower than that in the targets which is calculated to be Al/Ti=0.44. X-ray diffraction measurement showed that the lattice parameter of TiAlN coating increased from 4.22Å to 4.54Å when lanthanum is added and the position of (111) peak shifted to higher angles with the N2 flow ratio increases. Much more dense and finer grained morphology was observed when the Ar/N2 flow ratios ranged from 100/20 to 60/60. The hardness of TiAlN coating increased when lanthanum is added, while, the elastic modulus decreased at the same time. The TiAlLaN coating prepared at Ar/N2=90/30 had the maximum H/E ratio. No edge chipping was observed in the scratch track line of the coating which was deposited at the Ar/N2 flow ratio of 90/30, and it is supposed to be related to the H/E ratio. TiAlLaN coating deposited under Ar/N2=90/30 had the lowest percentage of oxidized layer, which shows the best oxidation resistance.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: International Journal of Refractory Metals and Hard Materials
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
