Abstract
The results of investigation of the effect of ion-plasma treatment in Ar plasma with ion energies ei = 15-30 eV on residual stress in thin Cr films are presented. Mean stress depending on ei and treatment time t was determined using Xray diffractometry and test microbridges, stress gradient was determined using test microcantilevers. The Cr films initially had compressive stress and a positive value of the stress gradient that is they had greater compressive stress near the interface than near the surface. The treatments at ei = 15-25 eV, t = 15-45 min led to increase in compressive stress. The treatments of Cr films at ei = 25-30 eV, t = 60 min led to decrease of the initial compressive stress. The stress gradient after ion-plasma treatment at ei above 15 eV increased. The higher the ion energy or the longer the treatment time, the greater the value of the stress gradient.
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