Abstract
Uniaxial magnetic anisotropy has been induced in multi-element soft magnetic amorphous FeNiPGd thin films, which were fabricated by electroplating with an external magnetic field applied parallel to the plane of the electrode. After the application of the magnetic field, surface morphology of the FeNiPGd layer is improved. The crystal grains are refined, and the number of pores generated on the surface is remarkably reduced. The introduction of external magnetic field can significantly improve the deposition rate and dynamic permeability. And the cutoff frequency can achieve 500 MHz when the applied magnetic field is 40 mT during the deposition process. Specifically, the in-plane anisotropy field of the film was calculated by the area integral method to be approximately 116Oe while the magnetic field is 10 mT, which is obviously higher than that of the binary FeNi material.
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