Abstract
Abstract Lithium fluoride thin films were successfully deposited on glass substrates using a well known vacuum evaporation method by means of resistive heating at (10-3Torr). These thin films were then annealed for 350°C, 400°C and 450°C respectively. The annealed thin films were characterized for structural surface morphological and optical properties; the annealing temperature strongly affects the properties of LiF thin films the crystallite size was found to increase with respect to increase in annealing temperature. The increase in annealing temperature also affects the optical properties of the LiF thin films show improved transmittance with respect to increase in annealing temperature, the refractive index increases whereas optical band decreases with increase in annealing temperature.
Published Version
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
