Effect of annealing temperature on physical properties and photoelectrochemical behavior of electrodeposited nanostructured NiO thin films for optoelectronic applications

Abstract

Our paper used a low-cost electrodeposition technique to grow Nickel Oxide (NiO) thin films on fluorine-doped tin oxide (FTO) substrate. As-deposited films were annealed at different temperatures (350, 400, 450, and 500 °C). X-ray diffraction (XRD), Raman spectroscopy (RAM), scanning electron microscopy (SEM), UV–vis spectrophotometer, photoluminescence (PL), Cyclic voltammetry (CV), photocurrent (PC), electrochemical impedance spectroscopy (EIS), and Mott-Schottky analysis (MS) were used to study and investigate the effect of annealing temperatures on the structural, morphological, electrical, and optical properties of prepared thin films. XRD patterns proved the cubic phase of all NiO samples with the preferential orientation in (111) direction. SEM results showed that the grain size increased with increasing annealing temperature. The optical transmission was studied by a UV–vis spectrophotometer, where high transmittance for NiO thin films was found to vary in the range of 73–84 % in the visible wavelength region, depending on the annealing temperatures. At the same time, UV–visible measurements indicate an absorption band edge at 311 nm, mainly recognized as a characteristic direct band gap for prepared NiO. The optical gap calculated from the Tauc relation showed a decreasing trend from 3.97 to 3.86 eV with increasing annealing temperature from 300 °C to 500 °C. PL spectra of synthesized samples revealed two distinct emission peaks at around 400 nm and 490 nm. RAM analysis confirmed the presence of three characteristic peaks related to the vibration of Ni–O bonds. The NiO film annealed at 500 °C displays the highest specific capacitance value by CV analysis. The P-type conductivity of manufactured arrays and enhanced electrical properties were confirmed by PC, EIS, and MS analysis. The highest carrier concentration values (9.19 × 1018 cm−3) and flat band potential (0.82 V) were obtained for samples annealed at 500 °C. Our outcomes proved that NiO-500 °C thin films are ideal candidates for optoelectronic applications.