Abstract
Amorphous FeSiBNb films with various Nb content were prepared via DC magnetron sputtering, and the effect of the annealing temperature on the magnetic properties of the films was investigated. The as-deposited samples exhibited an in-plane magnetic anisotropy and a large coercivity. Annealing at a certain temperature resulted in the decrease of the coercivity to the minimum value indicating the homogenization of the internal stress distribution. Also, the in-plane magnetic anisotropy almost disappeared due to the isotropic-tensile stress induced by the difference in the linear expansion coefficient between the substrate and the film. The in-plane anisotropy also disappeared after annealing. It is inferred that the addition of Nb raises the crystallization temperature and lowers the minimum coercivity of the film.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
