Abstract

We have investigated the structural, electrical and optical properties of thin films deposited by RF magnetron sputtering and then annealed at and in vacuum. The structural and electrical properties are strongly related to annealing temperature. All the annealed films are grown as a hexagonal wurtzite phase and the largest grain size is observed in the films annealed at . The sheet resistance decreases with a increase in annealing temperature and film annealed at shows the lowest sheet resistance of . The optical transmittance of films in a visible wavelength region also depends on the annealing temperature. The films annealed at show higher transmittance of 76% than those of the films prepared in this study.

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