Abstract
The magnetic and magnetooptical properties of 50-to 200-nm-thick Ni films, both as-deposited and annealed at Tann = 300, 400, or 500°C, were studied. Volume and near-surface hysteresis loops were measured with a vibrating-sample magnetometer (VSM) and with the use of the transverse Kerr effect (TKE). The annealing temperature was found to exert a strong effect on the magnetic characteristics of the samples under study. It was established, in particular, that the coercivity H C of Ni films increases and the remanent magnetization decreases with increasing annealing temperature. The observed dependences of the magnetic properties of the films on film thickness and annealing temperature are explained as being due to microstructural characteristics of the samples. It was found that, while TKE spectra obtained in the incident-photon energy region from 1.5 to 6 eV have the same shape for all the Ni films studied, the magnitude of the TKE decreases with increasing Tann. This experimental observation is accounted for by the decreased saturation magnetization of the annealed films.
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