Abstract
the electrochromic thin layer of Tungsten trioxide (WO3) was RF sputtered on FTO (fluorine-doped tin oxide) slide. In a reactive Ar + O2 gas environment with varying oxygen partial pressures, the deposition continued. The samples were air annealed at 400 °C for 2 h after being deposited at room temperature. SEM, XRD, UV–Visible spectrometer, and electrochemical analyzer characterization methods were employed to analyze the surface, structural morphology, optical, and electrochromic behaviour of the deposited material after annealing. The Optical Bandgap and Transmittance were found to be of a higher value for air annealed samples than RT deposited samples because RT deposited samples are amorphous whereas air annealed samples exhibit crystalline nature with Oxidation, reduction peak currents variation with respect to the temperature.
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