Abstract
In this paper, effect of annealing and O 2 pressure on the structural and optical properties of pulsed laser deposited thin films of TiO 2 is reported. XRD, FTIR spectra and SEM images confirm that at high annealing temperatures, the rutile phase and crystalline quality of thin films increases. Higher pressure of O 2 during deposition improves the rutile phase and favors the rod like growth of TiO 2 thin film. The red shift in photoluminescence (PL) spectra of TiO 2 thin films with annealing temperature is reported. Contact angle measurement data for the thin films reveals the hydrophobic nature of the films. The very low reflectivity (∼10%) reported in this paper may be promising for anti-reflection coating applications of pulsed laser deposited TiO 2 thin films.
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